Title :
Recent development of the fore-vacuum plasma electron sources
Author_Institution :
High Current Electron. Inst., Tomsk, Russia
Abstract :
Summary form only given. This paper presents a review of recent development of physical and performances of co called “fore-vacuum plasma electron sources” operated at pressure range 10-100 Pa. A number of unique parameters of the e-beam were obtained, such as electron dc energy (to 20 keV), dc beam current (up 0.5 A), pulsed current (up to 100A, 1 ms) and total e-beam power (up to 5 kW). For electron beam generation at these relatively high pressures, the following special features are important: high probability of electrical breakdown within the accelerating gap, a strong influence of back-streaming ions both the emission electrode and the emitting plasma, generation of secondary plasma in the beam propagation region, and intense beam-plasma interactions that lead in turn to broadening of the beam energy spectrum and beam defocusing. The descriptions of several fore-pump plasma electron sources, its performances and parameters are also presented. Main application area is electron beam treatment of non-conducting high temperature ceramics.
Keywords :
electric breakdown; electron beams; electron sources; plasma sources; plasma-beam interactions; spectral line broadening; accelerating gap; back-streaming ions; beam defocusing; beam energy spectrum broadening; beam propagation region; current 0.5 A; current 100 A; dc beam current; electrical breakdown probability; electron beam generation; electron beam treatment; electron dc energy; electron volt energy 20 keV; emission electrode; emitting plasma; fore-vacuum plasma electron sources; intense beam-plasma interactions; nonconducting high temperature ceramics; power 5 kW; pressure 10 Pa to 100 Pa; pulsed current; secondary plasma generation; time 1 ms; total e-beam power; Acceleration; Electric breakdown; Electron beams; Electron sources; Ions; Plasmas;
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
DOI :
10.1109/PLASMA.2013.6633472