Title :
Micromachining 3D hemispherical features in silicon via micro-EDM
Author :
Chan, M.L. ; Fonda, P. ; Reyes, C. ; Xie, J. ; Najar, H. ; Lin, L. ; Yamazaki, K. ; Horsley, D.A.
Author_Institution :
Dept. of Mech. & Aerosp. Eng., Univ. of California, Davis, CA, USA
fDate :
Jan. 29 2012-Feb. 2 2012
Abstract :
This paper presents an investigation of micro electrical discharge machining (μEDM) as a viable method for micromachining 3D shapes in silicon. The approach integrates a two-step μEDM process with standard silicon microfabrication techniques to create smooth and axisymmetric 3D hemispherical structures with eccentricity, ε ~ 0.11 and a radius variation <; 2%. Through the selection of ultrahard polycrystalline diamond as the μEDM electrode, the low tool wear allows for high throughput machining of 200 wells in silicon within a short total processing time of 80 min. Feasibility of the approach is demonstrated in the fabrication of millimeter scale hemispherical shell structures using the machined silicon features as a mold.
Keywords :
diamond; electrical discharge machining; elemental semiconductors; micromachining; silicon; μEDM electrode; 3D hemispherical feature micromachining; Si; axisymmetric 3D hemispherical structures; microelectrical discharge machining; millimeter scale hemispherical shell structures; silicon via microEDM; standard silicon microfabrication techniques; time 80 min; tool wear; two-step microEDM process; ultrahard polycrystalline diamond; Electrodes; Rough surfaces; Silicon; Surface roughness; Surface treatment; Three dimensional displays;
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2012 IEEE 25th International Conference on
Conference_Location :
Paris
Print_ISBN :
978-1-4673-0324-8
DOI :
10.1109/MEMSYS.2012.6170151