DocumentCode
354721
Title
Decreased depth of field in near-field microscopy
Author
Smith, Samuel ; Kwok, M. ; Orr, B.G. ; Kopelman, Raoul ; Norris, T.
Author_Institution
Center for Ultrfast Opt. Sci., Michigan Univ., Ann Arbor, MI, USA
fYear
1996
fDate
2-7 June 1996
Firstpage
127
Lastpage
128
Abstract
Summary form only given. Our work combining the equal pulse correlation (EPC) technique with the near-field scanning optical microscopy (NSOM) is, to our knowledge, the only femtosecond near-field measurement made by sending both "pump" and "probe" pulses through the NSOM tip. This arrangement may be advantageous when applying NSOM to "thick" samples, such as semiconductor materials and devices, because it appears to have a shallow depth of field built in to it. We present measurements that put an upper bound on the depth of field in this type of experiment and show the main features of the data can be qualitatively reproduced by a simple dipole model.
Keywords
optical correlation; optical microscopy; optical pumping; optical scanners; semiconductor materials; NSOM tip; equal pulse correlation; femtosecond near-field measurement; near-field microscopy depth of field; near-field scanning optical microscopy; probe pulses; pump pulses; semiconductor materials; simple dipole model; Laser mode locking; Laser theory; Microscopy; Optical amplifiers; Optical pulse generation; Optical pulses; Optimized production technology; Pulse amplifiers; Pump lasers; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location
Anaheim, CA, USA
Print_ISBN
1-55752-443-2
Type
conf
Filename
864454
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