• DocumentCode
    354721
  • Title

    Decreased depth of field in near-field microscopy

  • Author

    Smith, Samuel ; Kwok, M. ; Orr, B.G. ; Kopelman, Raoul ; Norris, T.

  • Author_Institution
    Center for Ultrfast Opt. Sci., Michigan Univ., Ann Arbor, MI, USA
  • fYear
    1996
  • fDate
    2-7 June 1996
  • Firstpage
    127
  • Lastpage
    128
  • Abstract
    Summary form only given. Our work combining the equal pulse correlation (EPC) technique with the near-field scanning optical microscopy (NSOM) is, to our knowledge, the only femtosecond near-field measurement made by sending both "pump" and "probe" pulses through the NSOM tip. This arrangement may be advantageous when applying NSOM to "thick" samples, such as semiconductor materials and devices, because it appears to have a shallow depth of field built in to it. We present measurements that put an upper bound on the depth of field in this type of experiment and show the main features of the data can be qualitatively reproduced by a simple dipole model.
  • Keywords
    optical correlation; optical microscopy; optical pumping; optical scanners; semiconductor materials; NSOM tip; equal pulse correlation; femtosecond near-field measurement; near-field microscopy depth of field; near-field scanning optical microscopy; probe pulses; pump pulses; semiconductor materials; simple dipole model; Laser mode locking; Laser theory; Microscopy; Optical amplifiers; Optical pulse generation; Optical pulses; Optimized production technology; Pulse amplifiers; Pump lasers; Ultrafast optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
  • Conference_Location
    Anaheim, CA, USA
  • Print_ISBN
    1-55752-443-2
  • Type

    conf

  • Filename
    864454