DocumentCode :
354721
Title :
Decreased depth of field in near-field microscopy
Author :
Smith, Samuel ; Kwok, M. ; Orr, B.G. ; Kopelman, Raoul ; Norris, T.
Author_Institution :
Center for Ultrfast Opt. Sci., Michigan Univ., Ann Arbor, MI, USA
fYear :
1996
fDate :
2-7 June 1996
Firstpage :
127
Lastpage :
128
Abstract :
Summary form only given. Our work combining the equal pulse correlation (EPC) technique with the near-field scanning optical microscopy (NSOM) is, to our knowledge, the only femtosecond near-field measurement made by sending both "pump" and "probe" pulses through the NSOM tip. This arrangement may be advantageous when applying NSOM to "thick" samples, such as semiconductor materials and devices, because it appears to have a shallow depth of field built in to it. We present measurements that put an upper bound on the depth of field in this type of experiment and show the main features of the data can be qualitatively reproduced by a simple dipole model.
Keywords :
optical correlation; optical microscopy; optical pumping; optical scanners; semiconductor materials; NSOM tip; equal pulse correlation; femtosecond near-field measurement; near-field microscopy depth of field; near-field scanning optical microscopy; probe pulses; pump pulses; semiconductor materials; simple dipole model; Laser mode locking; Laser theory; Microscopy; Optical amplifiers; Optical pulse generation; Optical pulses; Optimized production technology; Pulse amplifiers; Pump lasers; Ultrafast optics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
1-55752-443-2
Type :
conf
Filename :
864454
Link To Document :
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