DocumentCode :
3547268
Title :
Bistability under tension and its use in a threshold force sensor
Author :
Rabanim, S. ; Amir, E. ; Schreiber, D. ; Krylov, S.
Author_Institution :
Microsyst. Design & Characterization Lab., Tel Aviv Univ., Tel Aviv, Israel
fYear :
2012
fDate :
Jan. 29 2012-Feb. 2 2012
Firstpage :
1137
Lastpage :
1140
Abstract :
We report on a first experimental demonstration of a bistability phenomenon in a contactless device suspended using initially curved flexible beams and pulled by electrostatic forces directed along the beams. Devices of several configurations were fabricated from a silicon on insulator (SOI) substrate using a deep reactive ion etching (DRIE) based process and were actuated in-plane in ambient air conditions. We introduce a novel, less sensitive to the fabrication tolerances, operational scenario involving actuation by two parallel-plate electrodes and demonstrate that the bistable device can be used as a force sensor based on a pull-in voltage monitoring.
Keywords :
electrodes; force sensors; microsensors; silicon-on-insulator; sputter etching; ambient air condition; bistability phenomenon; bistable device; contactless device; deep reactive ion etching based process; electrostatic force; fabrication tolerance; flexible beam; parallel-plate electrode; pull-in voltage monitoring; silicon-on-insulator substrate; threshold force sensor; Accelerometers; Electrodes; Electrostatics; Force; Sensors; Suspensions; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2012 IEEE 25th International Conference on
Conference_Location :
Paris
ISSN :
1084-6999
Print_ISBN :
978-1-4673-0324-8
Type :
conf
DOI :
10.1109/MEMSYS.2012.6170363
Filename :
6170363
Link To Document :
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