Title :
Effective etalon reflectors with high damage threshold for erbium laser development
Author :
Eichler, Hans Joachim ; Liu, B. ; Sperlich, O.
Author_Institution :
Opt. Inst., Tech. Univ. Berlin, Germany
Abstract :
Summary form only given. In summary, our results demonstrate that thin plates made from infrared materials like Si can be used as effective etalon reflectors with high damage threshold for Er-doped solid state lasers. High reflectivity mirrors consisting of several silicon plates are under development.
Keywords :
erbium; laser mirrors; light interferometers; optical films; optical materials; reflectivity; silicon; solid lasers; Er-doped solid state lasers; Si; effective etalon reflectors; erbium laser development; high damage threshold; high reflectivity laser mirrors; infrared materials; silicon plates; thin plates; Coatings; Dielectrics; Erbium; Mirrors; Optical materials; Optical reflection; Reflectivity; Resonance; Semiconductor lasers; Silicon;
Conference_Titel :
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
1-55752-443-2
