DocumentCode
354750
Title
Effective etalon reflectors with high damage threshold for erbium laser development
Author
Eichler, Hans Joachim ; Liu, B. ; Sperlich, O.
Author_Institution
Opt. Inst., Tech. Univ. Berlin, Germany
fYear
1996
fDate
2-7 June 1996
Firstpage
147
Lastpage
148
Abstract
Summary form only given. In summary, our results demonstrate that thin plates made from infrared materials like Si can be used as effective etalon reflectors with high damage threshold for Er-doped solid state lasers. High reflectivity mirrors consisting of several silicon plates are under development.
Keywords
erbium; laser mirrors; light interferometers; optical films; optical materials; reflectivity; silicon; solid lasers; Er-doped solid state lasers; Si; effective etalon reflectors; erbium laser development; high damage threshold; high reflectivity laser mirrors; infrared materials; silicon plates; thin plates; Coatings; Dielectrics; Erbium; Mirrors; Optical materials; Optical reflection; Reflectivity; Resonance; Semiconductor lasers; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location
Anaheim, CA, USA
Print_ISBN
1-55752-443-2
Type
conf
Filename
864483
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