DocumentCode
3547558
Title
Novel conical microstructures created in silicon with femtosecond laser pulses
Author
Tsing-Hua Her ; Finlay, R.J. ; Wu, Chunlin ; Mazur, Eric ; Deliwala, Shrenik
Author_Institution
Harvard Univ., Cambridge, MA, USA
fYear
1998
fDate
3-8 May 1998
Firstpage
511
Lastpage
512
Abstract
Summary form only given. Silicon wafers are mounted inside a vacuum chamber backfilled with gas and then irradiated with 800-nm pulses from a regeneratively amplified Ti:sapphire laser. Following laser treatment, the samples are removed from the chamber and analyzed with a scanning electron microscope (SEM).
Keywords
high-speed optical techniques; laser beam effects; laser materials processing; scanning electron microscopy; silicon; 800 nm; SEM; Si; Si wafers; conical microstructures; femtosecond laser pulses; laser materials processing; laser treatment; regeneratively amplified Ti:sapphire laser; scanning electron microscope; silicon; vacuum chamber; Ionization; Laser ablation; Laser theory; Machining; Microstructure; Optical pulses; Optical scattering; Silicon; Surface emitting lasers; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-339-0
Type
conf
DOI
10.1109/CLEO.1998.676564
Filename
676564
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