DocumentCode :
3547619
Title :
Measurement of delay mismatch due to process variations by means of modified ring oscillators
Author :
Zhou, Bo ; Khouas, Abdelhakim
Author_Institution :
Dept. of Electr. Eng., Ecole Polytech. de Montreal, Que., Canada
fYear :
2005
fDate :
23-26 May 2005
Firstpage :
5246
Abstract :
A novel and effective test circuit to measure cell-to-cell delay mismatch due to process variations is presented. A fully digital control circuit that efficiently realizes the technique is also described. The proposed test structure is realized by a series of modified ring oscillators that minimize factors of inaccuracy. The results of a simulation using 0.18 μm CMOS technology show the feasibility of the technique. This test structure can be beneficial in thoroughly characterizing the effects of systematical process variations inside the chip.
Keywords :
CMOS integrated circuits; delays; digital control; integrated circuit testing; oscillators; 0.18 micron; CMOS technology; cell-to-cell delay mismatch; delay mismatch measurement; digital control circuit; modified ring oscillators; process variations; test circuit; CMOS technology; Circuit simulation; Circuit testing; Clocks; Delay effects; Digital control; Propagation delay; Ring oscillators; Semiconductor device measurement; Timing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 2005. ISCAS 2005. IEEE International Symposium on
Print_ISBN :
0-7803-8834-8
Type :
conf
DOI :
10.1109/ISCAS.2005.1465818
Filename :
1465818
Link To Document :
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