Title :
Characterization of the photo-EMF response for laser-based ultrasonic sensing under simulated industrial conditions
Author :
Pepper, D.M. ; Dunning, G.J. ; Chiao, M.P. ; O´Meara, T.R. ; Mitchell, P.V. ; Lahiri, I. ; Nolte, David D.
Author_Institution :
Hughes Res. Labs., Malibu, CA, USA
Abstract :
Summary form only given as follows. There is a desire in manufacturing environments to nondestructively evaluate components and control processes in real time. Laser-based ultrasound has the potential to be a robust diagnostic for many applications. A simple and inexpensive sensor based on the photoinduced-electromotive effect has been demonstrated to be functional under a variety of manufacturing conditions. To optimize the detector performance, a parametric study was undertaken in which we measured the bandwidth, linearity, and sensitivity of our device as a function of various sensor material properties and optical architectures, as well as under simulated (yet quantifiable) industrial conditions. To quantify the sensitivity of the detector, an interferometric apparatus was set up with a calibrated phase signal introduced by an electro-optic (EO) modulator in one of the legs. To simulate different amplitudes of ultrasonic surface displacements, the detector output was monitored as a function of the EO drive voltage, at a fixed-drive frequency. The data show a high degree of linearity in the displacement range of interest for many commercial applications.
Keywords :
acousto-optical modulation; electric potential; electro-optical modulation; light interferometers; optical sensors; photoacoustic effect; photodetectors; real-time systems; ultrasonic materials testing; bandwidth; calibrated phase signal; commercial applications; control processes; degree of linearity; detector output; detector performance; displacement range; electro-optic modulator; fixed-drive frequency; industrial conditions; interferometric apparatus; laser-based ultrasonic sensing; laser-based ultrasound; linearity; manufacturing conditions; manufacturing environments; nondestructively evaluation; optical architectures; parametric study; photo-EMF response; photoinduced-electromotive effect; real time evaluation; robust diagnostic; sensitivity; sensor material properties; simple inexpensive sensor; simulated industrial conditions; ultrasonic surface displacements; Detectors; Electrooptic modulators; Linearity; Manufacturing processes; Optical interferometry; Optical sensors; Process control; Robustness; Sensor phenomena and characterization; Ultrasonic imaging;
Conference_Titel :
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-339-0
DOI :
10.1109/CLEO.1998.676592