• DocumentCode
    354798
  • Title

    Optical limiting materials in the high-fluence regime

  • Author

    Pong, R.G.S. ; Shirk, J.S. ; Flom, S.R. ; Bartoli, Filbert J. ; Snow, Arthur W. ; Boyle, M.E.

  • Author_Institution
    US Naval Res. Lab., Washington, DC, USA
  • fYear
    1996
  • fDate
    2-7 June 1996
  • Firstpage
    178
  • Abstract
    Summary form only given. The aim of the present paper is to identify some of optical processes that occur in the high-fluence regime. Optical limiting, nonlinear transmission, and z-scan measurements are reported in the visible region of the spectrum. The contributions of nonlinear absorption and nonlinear refraction to the limiting were separately determined. Modeling the nonlinear absorption results with three-, four-, and five-level models suggest that both exciton-exciton annihilation and higher-order nonlinear absorption processes make important contributions to optical limiting. The higher order processes were found to contribute substantially to limiting in lead tetrakis(cumyl-phenoxy)phthalocyanine.
  • Keywords
    excitons; lead compounds; light absorption; limiters; nonlinear optics; optical materials; organic compounds; exciton-exciton annihilation; high-fluence regime; higher-order nonlinear absorption processes; lead tetrakis(cumyl-phenoxy)phthalocyanine; nonlinear absorption; nonlinear refraction; nonlinear transmission; optical limiting materials; optical processes; visible region; z-scan measurements; Dynamic range; Electromagnetic wave absorption; Laboratories; Nonlinear optics; Optical control; Optical materials; Optical refraction; Optimized production technology; Process control; Snow;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
  • Conference_Location
    Anaheim, CA, USA
  • Print_ISBN
    1-55752-443-2
  • Type

    conf

  • Filename
    864531