Title :
Comparative photothermal study of singleshot and multishot laser damage on UV multilayers
Author :
Ettrich, K. ; Blaschke, H. ; Welsch, E. ; Rudolph, W.
Author_Institution :
Inst. fur Opt. und Quantenelektronik, Friedrich-Schiller-Univ., Jena, Germany
Abstract :
Summary form only given. A photothermal two-probe-beam setup measuring the temperature as well as the displacement at the sample surface was used for single and multishot experiments. UV-laser pulses of 20 ns pulsewidth at a wavelength of 248 nm heat a sample.
Keywords :
diffusion; high-speed optical techniques; laser beam effects; optical films; photothermal effects; UV multilayers; UV-laser pulses; heat; multishot laser damage; ns pulsewidth; photothermal study; photothermal two-probe-beam setup; sample surface; singleshot laser damage; temperature measurement; Attenuation measurement; Coatings; Extraterrestrial measurements; Laser beams; Nonhomogeneous media; Optical films; Optical waveguides; Polymer films; Probes; Surface emitting lasers;
Conference_Titel :
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
1-55752-443-2
