DocumentCode :
3549759
Title :
Manufacturing-robotic-induced "mechanical" damages on semiconductor dies: mechanics, electrostatics or what else ?
Author :
Jacob, Peter ; Nicoletti, Giovanni
Author_Institution :
Dept. of Electronics/ Metrol., Empa Swiss Fed. Labs. for Mater. Testing & Res., Switzerland
fYear :
2005
fDate :
27 June-1 July 2005
Firstpage :
307
Lastpage :
312
Abstract :
The paper has described most common surface failure mechanisms, pointing out a frequent - unknown failure type called ESDFOS. The most significant diagnosis hints have been shown to distinguish it from other surface-related failures, like mechanically-, laser-, FIB- or preparation artifact-driven surface-failure-mechanisms. The root cause for ESDFOS are mainly post wafer-assembly processes. That\´s why test results degrade from wafer final test to post-assembly test results. A "standardized" procedure has been recommended considering assembly process tool audits on ESD. Finally, the ouput of this paper should make the F/A community more sensitive to this "new", old failure type.
Keywords :
assembling; electrostatic discharge; failure (mechanical); failure analysis; semiconductor device reliability; ESDFOS; post wafer-assembly process; post-assembly test; robotic-induced mechanical damage; semiconductor dies; surface failure mechanisms; Assembly; Electrostatic discharge; Head; Liquid crystal devices; Optical microscopy; Particle beam optics; Protection; Semiconductor device manufacture; Stimulated emission; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2005. IPFA 2005. Proceedings of the 12th International Symposium on the
Print_ISBN :
0-7803-9301-5
Type :
conf
DOI :
10.1109/IPFA.2005.1469185
Filename :
1469185
Link To Document :
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