DocumentCode :
3549813
Title :
Stable SRAM cell design for the 32 nm node and beyond
Author :
Chang, Leland ; Fried, David M. ; Hergenrother, Jack ; Sleight, Jeffrey W. ; Dennard, Robert H. ; Montoye, Robert K. ; Sekaric, Lidija ; McNab, Sharee J. ; Topol, Anna W. ; Adams, Charlotte D. ; Guarini, Kathryn W. ; Haensch, Wilfried
Author_Institution :
IBM Semicond. R&D Center, IBM Semicond. R&D Center, Hopewell Junction, NY, USA
fYear :
2005
fDate :
14-16 June 2005
Firstpage :
128
Lastpage :
129
Abstract :
SRAM cell stability will be a primary concern for future technologies due to variability and decreasing power supply voltages. 6T-SRAM can be optimized for stability by choosing the cell layout, device threshold voltages, and the β ratio. 8T-SRAM, however, provides a much greater enhancement in stability by eliminating cell disturbs during a read access, thus facilitating continued technology scaling. We demonstrate the smallest 6T (0.124μm2 half-cell) and full 8T (0.1998μm2) cells to date.
Keywords :
SRAM chips; circuit optimisation; circuit stability; integrated circuit layout; 32 nm; 6T-SRAM; 8T-SRAM; SRAM cell design; SRAM cell stability; cell layout; device threshold voltages; power supply voltages; Degradation; Fluctuations; Inverters; Lifting equipment; Microelectronics; Random access memory; Research and development; Stability; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 2005. Digest of Technical Papers. 2005 Symposium on
Print_ISBN :
4-900784-00-1
Type :
conf
DOI :
10.1109/.2005.1469239
Filename :
1469239
Link To Document :
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