DocumentCode :
355077
Title :
Laser-induced forward transfer of carbon and chromium films in gases of one atmosphere pressure
Author :
Poon, C.C. ; Tam, A.C.
Author_Institution :
IBM Res. Div., Almaden Res. Center, San Jose, CA, USA
fYear :
1996
fDate :
2-7 June 1996
Firstpage :
377
Lastpage :
378
Abstract :
Summary form only given. The "Laser-Induced Forward Transfer" (LIFT) technique utilizes pulsed laser irradiation to transfer a thin-film material from an "emitting" surface to a "collecting" surface. Here, we show for the first time that LIFT can produce patterned spots of desired thicknesses, and we also compare ambient gas of air versus helium at one atmosphere pressure. We utilize a focussed pulsed laser beam of high repetition rate to produce localized transfer from the emitting film to the collecting surface with high spatial resolution. The adjustment of the spot thickness is achieved by translating the emitting film after each laser pulse while keeping the irradiation spot and the collecting surface stationary.
Keywords :
carbon; chromium; laser materials processing; metallic thin films; thin films; C; Cr; laser-induced forward transfer; pulsed laser irradiation; thin-film material; Atmosphere; Carbon dioxide; Chromium; Gas lasers; Gases; Helium; Optical materials; Optical pulses; Surface emitting lasers; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
1-55752-443-2
Type :
conf
Filename :
864814
Link To Document :
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