DocumentCode :
3550927
Title :
Complexity reduction of a thin film deposition model using a trajectory based nonlinear model reduction technique
Author :
Wolfrum, Philipp ; Vargas, Alejandro ; Gallivan, Martha ; Allgöwer, Frank
Author_Institution :
Institule for Neuroinformatics, Ruhr-Univ., Bochum, Germany
fYear :
2005
fDate :
8-10 June 2005
Firstpage :
2566
Abstract :
The paper proposes the use of a complexity reduction procedure based on nonlinear system identification techniques on a kinetic Monte Carlo simulation model of thin film deposition. This procedure combines frequency domain identification with nonlinear structure selection techniques and generalised basis function parameterization of a Volterra structure. It is used successfully to model the roughness response to time-varying temperature inputs during the deposition of germanium on a cubic Ge(001) lattice, reducing the original model by three orders of magnitude.
Keywords :
Monte Carlo methods; Volterra series; coating techniques; germanium; identification; liquid phase deposition; nonlinear control systems; process control; reduced order systems; thin films; vapour deposition; Volterra structure; complexity reduction; germanium; kinetic Monte Carlo simulation; nonlinear system identification; thin film deposition model; trajectory based nonlinear model reduction technique; Chemical engineering; Computational modeling; Equations; Frequency domain analysis; Kinetic theory; Monte Carlo methods; Nonlinear systems; Reduced order systems; Sputtering; Systems engineering and theory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
American Control Conference, 2005. Proceedings of the 2005
ISSN :
0743-1619
Print_ISBN :
0-7803-9098-9
Electronic_ISBN :
0743-1619
Type :
conf
DOI :
10.1109/ACC.2005.1470353
Filename :
1470353
Link To Document :
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