• DocumentCode
    3550927
  • Title

    Complexity reduction of a thin film deposition model using a trajectory based nonlinear model reduction technique

  • Author

    Wolfrum, Philipp ; Vargas, Alejandro ; Gallivan, Martha ; Allgöwer, Frank

  • Author_Institution
    Institule for Neuroinformatics, Ruhr-Univ., Bochum, Germany
  • fYear
    2005
  • fDate
    8-10 June 2005
  • Firstpage
    2566
  • Abstract
    The paper proposes the use of a complexity reduction procedure based on nonlinear system identification techniques on a kinetic Monte Carlo simulation model of thin film deposition. This procedure combines frequency domain identification with nonlinear structure selection techniques and generalised basis function parameterization of a Volterra structure. It is used successfully to model the roughness response to time-varying temperature inputs during the deposition of germanium on a cubic Ge(001) lattice, reducing the original model by three orders of magnitude.
  • Keywords
    Monte Carlo methods; Volterra series; coating techniques; germanium; identification; liquid phase deposition; nonlinear control systems; process control; reduced order systems; thin films; vapour deposition; Volterra structure; complexity reduction; germanium; kinetic Monte Carlo simulation; nonlinear system identification; thin film deposition model; trajectory based nonlinear model reduction technique; Chemical engineering; Computational modeling; Equations; Frequency domain analysis; Kinetic theory; Monte Carlo methods; Nonlinear systems; Reduced order systems; Sputtering; Systems engineering and theory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    American Control Conference, 2005. Proceedings of the 2005
  • ISSN
    0743-1619
  • Print_ISBN
    0-7803-9098-9
  • Electronic_ISBN
    0743-1619
  • Type

    conf

  • DOI
    10.1109/ACC.2005.1470353
  • Filename
    1470353