Laser-driven deposition of thin films from carbonyls of transitional metals

Summary form only given. Laser chemical vapor deposition (LCVD) from volatile metal carbonyls is of a great interest because of its application to solid-state microelectronics. To control LCVD processes kinetic data about deposition processes of elements that are forming thin films on the substrate surface is needed. LCVD processes from carbonyls of transitional metals may be directed at different wavelengths and powers. In general these processes may be thermochemical or photochemical. In the present work LCVD from such carbonyls as Cr(CO)/sub 6/, Mo(CO)/sub 6/ and Fe(CO)/sub 5/ was investigated.