DocumentCode :
3551529
Title :
Techniques employed in the fabrication of P-N-P power alloy transistors
Author :
Robillard, T.R.
Author_Institution :
Bell Telephone Laboratories
Volume :
1
fYear :
1955
fDate :
1955
Firstpage :
24
Lastpage :
24
Abstract :
The general mechanical details as well as the electrical properties of the 2N66 power alloy transistor are presented. Flat and planar junctions, which are being produced on and oriented germanium, are primarily attributed to alloy fixture design, alloying cycle, and crystal orientation. The design of the alloying fixture permits "one-shot" alloying and insures close control of collector capacitance, current amplification ratio, and frequency cut-off. Both collector and emitter electrodes are alloyed under pressure which aids substantially in producing uniform wetting during the alloying process. Assembled units are being etched with a superoxol-hydrofluoric acid-hydrochloric acid etch which produces good junction characteristics. Reliability studies indicate that reasonable aging trends result if the units are encapsulated in a dry air ambient.
Keywords :
Alloying; Assembly; Capacitance; Cutoff frequency; Electrodes; Etching; Fabrication; Fixtures; Germanium alloys; Mechanical factors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1955 International
Type :
conf
DOI :
10.1109/IEDM.1955.186938
Filename :
1471985
Link To Document :
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