DocumentCode
3551768
Title
Germanium P-N junction - Tunnel junction combination devices
Author
Lesk, I.A. ; Jensen, H.A.
Author_Institution
General Electric Company, Syracuse, New York
fYear
1959
fDate
29-30 Oct. 1959
Firstpage
46
Lastpage
46
Abstract
A P-N junction tunnel diode (designed PT N), in the low voltage region preceding the negative resistance, has current carried across the P-N junction primarily by electron tunneling, with very little minority carrier injection. In the higher current region following the negative resistance, minority carrier injection occurs. Despite some electron tunneling in this region and the very high impurity concentrations on both sides of the P-N boundary, injection efficiencies can be appreciable. Germanium PT NP transistors, having a tunnel junction emitter and a normal junction collector, were made by a combination of diffusion and alloying processes. They exhibit a current gain of essentially zero at low emitter currents, jumping abruptly to a finite value at the tunnel junction peak current, and remaining quite constant at higher currents. This effect was applied to control the characteristics of switches, for which PT NPN structures were used. The PT NPN triode can be made to have the switching current equal to the tunnel junction peak current, and the hold current equal to the tunnel junction valley current. A base current equal to the peak current can be used to turn the device on. These structures can be made to have quite stable properties from-70°C to + 100°C, since germanium tunnel diodes show little change in characteristics over this temperature range.
Keywords
Alloying; Diodes; Electrons; Germanium alloys; Impurities; Low voltage; P-n junctions; Switches; Temperature distribution; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1959 International
Conference_Location
Washington, DC, USA
Type
conf
DOI
10.1109/IEDM.1959.187118
Filename
1472657
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