DocumentCode
3551933
Title
Hot-glass sealed silicon diodes
Author
Decker, Vincent ; Forster, J.H. ; Howard, B.T.
Volume
7
fYear
1961
fDate
1961
Firstpage
64
Lastpage
66
Abstract
A hard-glass kovar encapsulation technique for hermetically sealing diffused silicon mesa diodes is described. The seal-in operation is a hot-seal technique, since the glass parts of the package reach temperatures from 800°C to 1000°C during the final sealing operation, and the silicon wafer is exposed to high temperatures during closure of the package. Experiments with this structure indicate that this hot-seal process leads to a relatively clean, dry environment and a stable semiconductor surface. Electrical characteristics of silicon wafers are preserved or improved by hot seal-in, and the encapsulated diodes exhibit a high degree of electrical stability.
Keywords
Electric variables; Encapsulation; Glass; Hermetic seals; Lead compounds; Semiconductor device packaging; Semiconductor diodes; Silicon; Surface cleaning; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1961 Internationa
Type
conf
DOI
10.1109/IEDM.1961.187243
Filename
1473079
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