• DocumentCode
    3551933
  • Title

    Hot-glass sealed silicon diodes

  • Author

    Decker, Vincent ; Forster, J.H. ; Howard, B.T.

  • Volume
    7
  • fYear
    1961
  • fDate
    1961
  • Firstpage
    64
  • Lastpage
    66
  • Abstract
    A hard-glass kovar encapsulation technique for hermetically sealing diffused silicon mesa diodes is described. The seal-in operation is a hot-seal technique, since the glass parts of the package reach temperatures from 800°C to 1000°C during the final sealing operation, and the silicon wafer is exposed to high temperatures during closure of the package. Experiments with this structure indicate that this hot-seal process leads to a relatively clean, dry environment and a stable semiconductor surface. Electrical characteristics of silicon wafers are preserved or improved by hot seal-in, and the encapsulated diodes exhibit a high degree of electrical stability.
  • Keywords
    Electric variables; Encapsulation; Glass; Hermetic seals; Lead compounds; Semiconductor device packaging; Semiconductor diodes; Silicon; Surface cleaning; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1961 Internationa
  • Type

    conf

  • DOI
    10.1109/IEDM.1961.187243
  • Filename
    1473079