DocumentCode
3552347
Title
A resonant gate silicon bandpass transistor
Author
Nathanson, H.C. ; Newell, W.E. ; Wickstrom, R.A.
Author_Institution
Westinghouse Research Laboratories, Pittsburgh, Pa.
Volume
11
fYear
1965
fDate
1965
Firstpage
38
Lastpage
38
Abstract
The use of a suspended clamped-free cantilever beam as the gate electrode for an MOS-type silicon transistor results in a minute, very high Q bandpass filter for integrated circuits. The center frequency of this filter is equal to the mechanical resonant frequency of the cantilever beam electrode. In operation, the metal cantilever is electrically polarized. Input signals are applied between the cantilever and an additional insulated input gate located underneath a portion of the cantilever away from the source-drain regions of the transistor. Electrostatic forces, exerted on the cantilever by the input signal, cause a relatively large cantilever motion perpendicular to the silicon surface at mechanical resonance, with subsequent field-effect modulation of the channel conductance and a corresponding A.C. output voltage. Input frequencies off resonance are rejected.
Keywords
Band pass filters; Electrodes; Electrostatics; Insulation; Polarization; Resonance; Resonant frequency; Silicon; Structural beams; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1965 International
Type
conf
DOI
10.1109/IEDM.1965.187573
Filename
1474154
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