• DocumentCode
    3552347
  • Title

    A resonant gate silicon bandpass transistor

  • Author

    Nathanson, H.C. ; Newell, W.E. ; Wickstrom, R.A.

  • Author_Institution
    Westinghouse Research Laboratories, Pittsburgh, Pa.
  • Volume
    11
  • fYear
    1965
  • fDate
    1965
  • Firstpage
    38
  • Lastpage
    38
  • Abstract
    The use of a suspended clamped-free cantilever beam as the gate electrode for an MOS-type silicon transistor results in a minute, very high Q bandpass filter for integrated circuits. The center frequency of this filter is equal to the mechanical resonant frequency of the cantilever beam electrode. In operation, the metal cantilever is electrically polarized. Input signals are applied between the cantilever and an additional insulated input gate located underneath a portion of the cantilever away from the source-drain regions of the transistor. Electrostatic forces, exerted on the cantilever by the input signal, cause a relatively large cantilever motion perpendicular to the silicon surface at mechanical resonance, with subsequent field-effect modulation of the channel conductance and a corresponding A.C. output voltage. Input frequencies off resonance are rejected.
  • Keywords
    Band pass filters; Electrodes; Electrostatics; Insulation; Polarization; Resonance; Resonant frequency; Silicon; Structural beams; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1965 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1965.187573
  • Filename
    1474154