Title :
Preparation and characterization of polysulfide treated InP MIS structures
Author :
Iyer, R. ; Bollig, B. ; Lile, D.L.
Author_Institution :
Dept. of Electr. Eng., Colorado State Univ., Fort Collins, CO, USA
Abstract :
It is shown that InP treated with a polysulfide solution prepared by bubbling O2 through ammonium sulfide with excess sulfur dissolved results in excellent interfaces, whereas polysulfide-free solutions have little effect. Interface state densities of 1010 cm-2 eV-1 as judged by quasi-static CV measurements were obtained on polysulfide treated MIS structures coated with IPCVD SiO2. Low temperature PL spectra show marked difference on polysulfide treated InP when compared to InP that was treated with commercially available ammonium sulfide. Low temperature gated PL spectra, measured using a semi-transparent gate MIS structure as a function of gate bias, show easier band bending for polysulfide passivated InP. Raman studies indicate smaller depletion widths and lower barrier heights due to lower interface states on such treated samples
Keywords :
III-V semiconductors; Raman spectra of inorganic solids; indium compounds; interface electron states; luminescence of inorganic solids; metal-insulator-semiconductor structures; passivation; photoluminescence; III-V semiconductor; InP; MIS structures; Raman studies; barrier heights; depletion widths; gate bias; interface state densities; passivation; photoluminescence spectra; polysulfide treated; quasi-static CV measurements; semi-transparent gate; Capacitance-voltage characteristics; Computer interfaces; Density measurement; Etching; Frequency; Gold; Indium phosphide; Interface states; Plasma temperature; Surface treatment;
Conference_Titel :
Indium Phosphide and Related Materials, 1991., Third International Conference.
Conference_Location :
Cardiff
Print_ISBN :
0-87942-626-8
DOI :
10.1109/ICIPRM.1991.147452