DocumentCode
3552494
Title
Preparation and characterization of polysulfide treated InP MIS structures
Author
Iyer, R. ; Bollig, B. ; Lile, D.L.
Author_Institution
Dept. of Electr. Eng., Colorado State Univ., Fort Collins, CO, USA
fYear
1991
fDate
8-11 Apr 1991
Firstpage
621
Lastpage
625
Abstract
It is shown that InP treated with a polysulfide solution prepared by bubbling O2 through ammonium sulfide with excess sulfur dissolved results in excellent interfaces, whereas polysulfide-free solutions have little effect. Interface state densities of 1010 cm-2 eV-1 as judged by quasi-static CV measurements were obtained on polysulfide treated MIS structures coated with IPCVD SiO2. Low temperature PL spectra show marked difference on polysulfide treated InP when compared to InP that was treated with commercially available ammonium sulfide. Low temperature gated PL spectra, measured using a semi-transparent gate MIS structure as a function of gate bias, show easier band bending for polysulfide passivated InP. Raman studies indicate smaller depletion widths and lower barrier heights due to lower interface states on such treated samples
Keywords
III-V semiconductors; Raman spectra of inorganic solids; indium compounds; interface electron states; luminescence of inorganic solids; metal-insulator-semiconductor structures; passivation; photoluminescence; III-V semiconductor; InP; MIS structures; Raman studies; barrier heights; depletion widths; gate bias; interface state densities; passivation; photoluminescence spectra; polysulfide treated; quasi-static CV measurements; semi-transparent gate; Capacitance-voltage characteristics; Computer interfaces; Density measurement; Etching; Frequency; Gold; Indium phosphide; Interface states; Plasma temperature; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1991., Third International Conference.
Conference_Location
Cardiff
Print_ISBN
0-87942-626-8
Type
conf
DOI
10.1109/ICIPRM.1991.147452
Filename
147452
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