• DocumentCode
    3552632
  • Title

    Radiation resistant MOS devices

  • Author

    Lindmayer, J.

  • Volume
    13
  • fYear
    1967
  • fDate
    1967
  • Firstpage
    40
  • Lastpage
    42
  • Abstract
    A detailed study indicates that the radiation resistance of MOS transistors is controlled by the details of the technology. It has been found that an MOS structure can be created that remains operational for gamma radiation doses of greater than 107Rad. It will be shown how the radiation resistance varies with gate oxidation and the particular metals employed. The interrelation between radiation and thermal stability will also be discussed. It will be shown that there is some connection between the two as long as the same basic technology is used. It is possible, however, that combinations which result in thermal stability can still show a low radiation resistance.
  • Keywords
    Bipolar transistors; Electric resistance; Electrical resistance measurement; MOS devices; Oxidation; Thermal resistance; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1967 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1967.187802
  • Filename
    1474883