DocumentCode
3552632
Title
Radiation resistant MOS devices
Author
Lindmayer, J.
Volume
13
fYear
1967
fDate
1967
Firstpage
40
Lastpage
42
Abstract
A detailed study indicates that the radiation resistance of MOS transistors is controlled by the details of the technology. It has been found that an MOS structure can be created that remains operational for gamma radiation doses of greater than 107Rad. It will be shown how the radiation resistance varies with gate oxidation and the particular metals employed. The interrelation between radiation and thermal stability will also be discussed. It will be shown that there is some connection between the two as long as the same basic technology is used. It is possible, however, that combinations which result in thermal stability can still show a low radiation resistance.
Keywords
Bipolar transistors; Electric resistance; Electrical resistance measurement; MOS devices; Oxidation; Thermal resistance; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1967 International
Type
conf
DOI
10.1109/IEDM.1967.187802
Filename
1474883
Link To Document