DocumentCode
3552734
Title
Silicon-on-sapphire bipolar transistors
Author
Heiman, F.P. ; Robinson, P.H.
Author_Institution
RCA Laboratories, Princeton, N. J.
Volume
13
fYear
1967
fDate
1967
Firstpage
136
Lastpage
136
Abstract
All-epitaxial bipolar transistors have been fabricated in silicon-on-sapphire films which exhibit a common-emitter low frequency current gain hfe of 10 at room temperature. The value of hfe increases approximately as the square of the absolute temperature, which suggests recombination by charged coulomb centers in the base region. Monotonic increase in hfe with collector current up to 100 mA (emitter area is 0.8 × 1.2 sq. mils) is probably due to trap-filling in the base region. No conductivity modulation, which would result in beta fall-off, is seen up to 500 mA of collector current. This is a narrow (
M), heavily doped (
cm-3) base region.
M), heavily doped (
cm-3) base region.Keywords
Bipolar transistors; Doping; Fabrication; Frequency; Germanium; Laboratories; Semiconductor films; Silicon; Temperature; Wideband;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1967 International
Type
conf
DOI
10.1109/IEDM.1967.187896
Filename
1474977
Link To Document