• DocumentCode
    3552734
  • Title

    Silicon-on-sapphire bipolar transistors

  • Author

    Heiman, F.P. ; Robinson, P.H.

  • Author_Institution
    RCA Laboratories, Princeton, N. J.
  • Volume
    13
  • fYear
    1967
  • fDate
    1967
  • Firstpage
    136
  • Lastpage
    136
  • Abstract
    All-epitaxial bipolar transistors have been fabricated in silicon-on-sapphire films which exhibit a common-emitter low frequency current gain hfeof 10 at room temperature. The value of hfeincreases approximately as the square of the absolute temperature, which suggests recombination by charged coulomb centers in the base region. Monotonic increase in hfewith collector current up to 100 mA (emitter area is 0.8 × 1.2 sq. mils) is probably due to trap-filling in the base region. No conductivity modulation, which would result in beta fall-off, is seen up to 500 mA of collector current. This is a narrow ( 0.6\\\\mu M), heavily doped ( \\sim 10^{7}; cm-3) base region.
  • Keywords
    Bipolar transistors; Doping; Fabrication; Frequency; Germanium; Laboratories; Semiconductor films; Silicon; Temperature; Wideband;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1967 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1967.187896
  • Filename
    1474977