• DocumentCode
    3552739
  • Title

    High-power, high-gain, subnanosecond-risetime amplification with electron beam - pn junction active devices

  • Author

    Norris, C.B., Jr.

  • Volume
    13
  • fYear
    1967
  • fDate
    1967
  • Firstpage
    138
  • Lastpage
    140
  • Abstract
    The principles of operation and performance limitations of a class of high-performance electron beam -- pn junction active devices are discussed. The primary assumptions are that (1) the beam diode is designed so that carrier generation and transport occur entirely in a region of high electric field, (2) carrier pairs are created near one edge of the beam diode by the electron bombardment, (3) carriers traverse the depletion region with a constant drift velocity, and (4) the beam diode is connected to a real load impedance, such as a reflectionless transmission line.
  • Keywords
    Electron beams; Epitaxial layers; Fabrication; Impedance; Nanoscale devices; Performance gain; Semiconductor diodes; Silicon; Substrates; Telephony;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1967 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1967.187900
  • Filename
    1474981