DocumentCode :
3552899
Title :
Silicone films for insulating layer in multilayer interconnection
Author :
Aoe, H. ; Yatsui, Y. ; Hayashida, T.
Author_Institution :
Sanyo Electric Research and Development Center, Osaka, Japan
Volume :
14
fYear :
1968
fDate :
1968
Firstpage :
84
Lastpage :
84
Abstract :
The object of this work was to evaluate silicon films crosslinked by electron irradiation as an insulating layer for multilayer interconnections in integrated circuits. It is now possible to make insulating layers of polymer silicones with micron-size patterns by electron beam techniques.
Keywords :
Insulation; Nonhomogeneous media; Semiconductor films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1968 International
Type :
conf
DOI :
10.1109/IEDM.1968.188011
Filename :
1475536
Link To Document :
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