DocumentCode
3553120
Title
Character discrimination using spatial filtering for defect detection in aperiodic patterns
Author
Tyler, A.L.
Volume
15
fYear
1969
fDate
1969
Firstpage
146
Lastpage
146
Abstract
Previous application of spatial filtering to integrated circuit photomask inspection used intensity filtering and took advantage of the grating effect of the periodic character of the photomask features. A stop filter of 0.8 mil diameter spots in a rectangular array with a spacing of 1.6 mils corresponding to the periodic distance in the mask was placed in the diffraction or Fourier transform plane. Aperiodic features were then detected.
Keywords
Apertures; Application specific integrated circuits; Diffraction; Filtering; Gas detectors; Inspection; Laboratories; Pattern analysis; Spatial filters; Telephony;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1969 International
Type
conf
DOI
10.1109/IEDM.1969.188196
Filename
1476077
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