DocumentCode :
3553191
Title :
Anodic processing of interconnect systems for integrated circuits
Author :
McMahon, W.R.
Author_Institution :
Texas Instruments Inc., Dallas, Texas
Volume :
16
fYear :
1970
fDate :
1970
Firstpage :
48
Lastpage :
48
Abstract :
Aluminum interconnect systems have become commonplace in the integrated circuit industry. Anodic processing of such systems takes advantage of the ease with which the aluminum metal conductor can be converted to an effective dielectric insulator for both single- and multilevel interconnect structures.
Keywords :
Integrated circuit interconnections;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1970 International
Type :
conf
DOI :
10.1109/IEDM.1970.188244
Filename :
1476356
Link To Document :
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