DocumentCode

3553703

Title

A very high speed low power bipolar integrated circuit process

Author

Cosand, A.E.

Author_Institution

TRW Systems Group, Redondo Beach, California

Volume

19

fYear

1973

fDate

1973

Firstpage

35

Lastpage

37

Keywords

Bipolar integrated circuits; Boron; Contact resistance; Delay; Etching; Frequency; Integrated circuit yield; Oxidation; Power dissipation; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1973 International

Type

conf

DOI

10.1109/IEDM.1973.188641

Filename

1477518