DocumentCode :
3553798
Title :
Theory of the M. O. S. transistor in weak inversion - new method to determine the number of surface states
Author :
Van Overstraeten, R. ; Declerck, G. ; Muls, P. ; Broux, G.
Author_Institution :
Katholieke Universiteit Lueven, Heverlee, Belgium
Volume :
19
fYear :
1973
fDate :
1973
Firstpage :
346
Lastpage :
349
Abstract :
The drain current IDversus gate voltage VGof a MOST operating in weak inversion, and the influence of surface potential fluctuations on this characteristic have been studied before [1] The purpose of this paper is to derive an expression of the drain current IDversus the drain voltage VDfor long channel devices. It is demonstrated that the surface potential fluctuations don´t affect the slope of the ID-VDcurve whereas the density NSSof surface states strongly influences the slope for small drain voltages. This yields a simple and useful technique to determine NSSon M.O.S. transistors.
Keywords :
Capacitance; Cascading style sheets; Dielectric substrates; Electron mobility; Fluctuations; Laboratories; MOSFETs; Poisson equations; Statistics; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1973 International
Type :
conf
DOI :
10.1109/IEDM.1973.188726
Filename :
1477603
Link To Document :
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