DocumentCode :
3553967
Title :
Use of platinum for lifetime control in power devices
Author :
Miller, M.D. ; Schade, H. ; Nuese, C.J.
Author_Institution :
RCA Laboratories, Princeton, New Jersey
Volume :
21
fYear :
1975
fDate :
1975
Firstpage :
180
Lastpage :
183
Abstract :
The diffusion of Pt into Si at temperatures between 800 and 1000°C has been found to provide room-temperature minority-carrier lifetimes between 1 µsec and 10 nsec. Evaluation of the dependence of lifetime on ambient temperature and on majority carrier doping as well as the measurement of thermally stimulated currents indicate the presence of two recombination centers: an acceptor located 0.26 eV below the conduction band edge for n-type Si and a donor located 0.32 eV above the valence band edge for p-type Si.
Keywords :
Charge measurement; Conductivity; Current measurement; Doping; Gold; Impurities; Platinum; Silicon; Temperature control; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1975 International
Type :
conf
DOI :
10.1109/IEDM.1975.188854
Filename :
1478215
Link To Document :
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