DocumentCode
3554090
Title
Hydrogen sensitive MOS structures
Author
Lundström, I. ; Shivaraman, M.S. ; Svensson, C.
Author_Institution
Chalmers University of Technology, Gothenburg, Sweden
Volume
21
fYear
1975
fDate
1975
Firstpage
631
Lastpage
634
Abstract
It is shown that hydrogen in the ambient atmosphere changes the flatband voltage of palladium gate MOS-structures. The physical mechanisms behind this phenomenon are discussed. Experimental results on the detection of hydrogen in air, argon and nitrogen are given. It is shown that the rate constants of chemical reactions on the Pd-surface are obtained from such experiments. The detection of hydrogen in hydrogen compounds like ammonia and of hydrogen in smoke is also demonstrated. Internal photoemission experiments, which support the results on the flatband voltage changes of MOS-structures, are briefly discussed.
Keywords
Argon; Atomic layer deposition; Capacitors; Chemicals; Equations; Hydrogen; Laboratories; Photoelectricity; Temperature distribution; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1975 International
Type
conf
DOI
10.1109/IEDM.1975.188966
Filename
1478327
Link To Document