• DocumentCode
    3554090
  • Title

    Hydrogen sensitive MOS structures

  • Author

    Lundström, I. ; Shivaraman, M.S. ; Svensson, C.

  • Author_Institution
    Chalmers University of Technology, Gothenburg, Sweden
  • Volume
    21
  • fYear
    1975
  • fDate
    1975
  • Firstpage
    631
  • Lastpage
    634
  • Abstract
    It is shown that hydrogen in the ambient atmosphere changes the flatband voltage of palladium gate MOS-structures. The physical mechanisms behind this phenomenon are discussed. Experimental results on the detection of hydrogen in air, argon and nitrogen are given. It is shown that the rate constants of chemical reactions on the Pd-surface are obtained from such experiments. The detection of hydrogen in hydrogen compounds like ammonia and of hydrogen in smoke is also demonstrated. Internal photoemission experiments, which support the results on the flatband voltage changes of MOS-structures, are briefly discussed.
  • Keywords
    Argon; Atomic layer deposition; Capacitors; Chemicals; Equations; Hydrogen; Laboratories; Photoelectricity; Temperature distribution; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1975 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1975.188966
  • Filename
    1478327