DocumentCode
3554160
Title
Two-dimensional finite element modeling of NPN devices
Author
Hachtel, G.D. ; Mack, M.H. ; O´Brien, R.R. ; Quinn, H.F.
Author_Institution
IBM T. J. Watson Research Center, Yorktown Heights, New York
Volume
22
fYear
1976
fDate
1976
Firstpage
166
Lastpage
169
Abstract
Our program for semiconductor analysis by finite elements has previously been applied to the analysis of IGFET devices. In this paper we describe the application of an experimental program to a state-of-the-art bipolar transistor in inverse active mode. We compute the hole and electron current distributions across the collector-base junction at low forward biases (the base-emitter junction is shorted). Our results show that (a) the injected hole current (from base to collector) is nearly uniform, and (b) the injected electron current (from collector to base) is greatest under the emitter, decreases under the oxide contact, and rises under the base contact. We conclude with a description of a novel method for solving the difficult problem of maintaining current conservation which is valid for finite elements of arbitrary approximation order. This new method employs Gummel\´s integral formula for the currents, but avoids the nonphysical "gaps" in current flow.
Keywords
Bipolar transistors; Charge carrier processes; Distributed computing; Electron emission; Finite difference methods; Finite element methods; Grid computing; Integral equations; Partial differential equations; Polynomials;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1976 International
Type
conf
DOI
10.1109/IEDM.1976.189010
Filename
1478722
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