• DocumentCode
    3554232
  • Title

    Correction of field distortion in the electron-beam lithography system, EL1

  • Author

    Loughran, J.F. ; Michail, M.S. ; Ryan, P.M. ; Engelke, H.

  • Author_Institution
    IBM System Products Division, East Fishkill, Hopewell Junction, New York
  • fYear
    1976
  • fDate
    6-8 Dec. 1976
  • Firstpage
    437
  • Lastpage
    439
  • Keywords
    Calibration; Clocks; Computer errors; Distortion measurement; Error correction; Lithography; Low-frequency noise; Noise measurement; Semiconductor device manufacture; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1976 International
  • Conference_Location
    Washigton, DC, USA
  • Type

    conf

  • DOI
    10.1109/IEDM.1976.189077
  • Filename
    1478789
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3554232