DocumentCode :
3554239
Title :
Thin film AlAs/GaAs on graphite solar cells
Author :
Johnston, W.D., Jr. ; Callahan, W.M.
Author_Institution :
Bell Telephone Laboratories, Inc., Holmdel, New Jersey
Volume :
22
fYear :
1976
fDate :
1976
Firstpage :
461
Lastpage :
464
Abstract :
We have prepared cells of polycrystalline N-AlAs on p-GaAs on graphite, with the III-V semiconductor layers grown by chloride transport vapor phase deposition. From the photocurrent response versus wavelength we infer electron diffusion lengths of 1.8 and 1.0 µm in the polycrystal GaAs at hole concentrations p ∼ 4 and 8 × 1018cm-3respectively. This indicates peak internal quantum efficiency exceeding 90%. External power efficiencies are limited by the large spreading resistance in the top AlAs layer due to poor majority carrier transfer across grain boundaries.
Keywords :
Boats; Gallium arsenide; Grain boundaries; Grain size; Inductors; Photovoltaic cells; Substrates; Temperature; Transistors; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1976 International
Type :
conf
DOI :
10.1109/IEDM.1976.189083
Filename :
1478795
Link To Document :
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