DocumentCode
355445
Title
Advances in oxide-confined vertical cavity lasers
Author
Choquette, Kent D. ; Schneider, R.P. ; Lear, K.L. ; Geib, Kent M. ; Hou, H.Q. ; Chui, H.C. ; Hagerott Crawford, M. ; Chow, W.W.
Author_Institution
Dept. of Photonics Res., Sandia Nat. Labs., Albuquerque, NM, USA
fYear
1996
fDate
7-7 June 1996
Firstpage
79
Lastpage
80
Abstract
Summary form only given. During the past two years significant performance advances have been achieved in selectively oxidized vertical-cavity surface emitting lasers (VCSELs), many of which have established overall benchmark records for semiconductor lasers. For example, a wall plug efficiency (at 1 nW output) of greater than 50% and threshold currents less than 10 /spl mu/A have been obtained from VCSELs containing a stable and low refractive index Al-oxide formed from AlGaAs. These oxidized VCSEL structures leverage the high oxidation selectivity of Al(Ga)As and the capability of forming buried oxide layers within the epilayers of the laser. Here we review the advances made in device fabrication, structure and performance of selectively oxidized VCSELs.
Keywords
optical fabrication; oxidation; semiconductor lasers; surface emitting lasers; 1 nW; 10 muA; 50 percent; AlGaAs; VCSEL; buried oxide layer; epilayer; fabrication; oxide-confined vertical-cavity surface emitting laser; selective oxidation; semiconductor laser; structure; threshold current; wall plug efficiency; Apertures; Distributed Bragg reflectors; Laser beams; Laser excitation; Mirrors; Polarization; Power lasers; Surface emitting lasers; Threshold current; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 1996. QELS '96., Summaries of Papers Presented at the
Conference_Location
Anaheim, CA, USA
Print_ISBN
1-55752-444-0
Type
conf
Filename
865594
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