• DocumentCode
    355445
  • Title

    Advances in oxide-confined vertical cavity lasers

  • Author

    Choquette, Kent D. ; Schneider, R.P. ; Lear, K.L. ; Geib, Kent M. ; Hou, H.Q. ; Chui, H.C. ; Hagerott Crawford, M. ; Chow, W.W.

  • Author_Institution
    Dept. of Photonics Res., Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    1996
  • fDate
    7-7 June 1996
  • Firstpage
    79
  • Lastpage
    80
  • Abstract
    Summary form only given. During the past two years significant performance advances have been achieved in selectively oxidized vertical-cavity surface emitting lasers (VCSELs), many of which have established overall benchmark records for semiconductor lasers. For example, a wall plug efficiency (at 1 nW output) of greater than 50% and threshold currents less than 10 /spl mu/A have been obtained from VCSELs containing a stable and low refractive index Al-oxide formed from AlGaAs. These oxidized VCSEL structures leverage the high oxidation selectivity of Al(Ga)As and the capability of forming buried oxide layers within the epilayers of the laser. Here we review the advances made in device fabrication, structure and performance of selectively oxidized VCSELs.
  • Keywords
    optical fabrication; oxidation; semiconductor lasers; surface emitting lasers; 1 nW; 10 muA; 50 percent; AlGaAs; VCSEL; buried oxide layer; epilayer; fabrication; oxide-confined vertical-cavity surface emitting laser; selective oxidation; semiconductor laser; structure; threshold current; wall plug efficiency; Apertures; Distributed Bragg reflectors; Laser beams; Laser excitation; Mirrors; Polarization; Power lasers; Surface emitting lasers; Threshold current; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quantum Electronics and Laser Science Conference, 1996. QELS '96., Summaries of Papers Presented at the
  • Conference_Location
    Anaheim, CA, USA
  • Print_ISBN
    1-55752-444-0
  • Type

    conf

  • Filename
    865594