DocumentCode :
3554512
Title :
Lifetime control by palladium diffusion in silicon
Author :
So, Lingkon ; Whiteley, J. Stanley ; Ghandhi, Sorab K. ; Baliga, B.Jayant
Author_Institution :
General Electric Company, Auburn, New York
Volume :
23
fYear :
1977
fDate :
1977
Firstpage :
494
Lastpage :
497
Abstract :
This paper will discuss the use of palladium for the control of lifetime in silicon power devices. It is shown that palladium has the advantage over platinum of lower solubility (by a factor of 20-50). As a result, greater process control can be achieved for lifetimes in the range that is desireable for power rectifiers and thyristors (0.1 to 1 µsec). Experiments, conducted on diodes made with both p- and n-type silicon, are used to establish the dominant lifetime controlling level in each case, together with its capture parameters. Finally, an assessment is made of the advantages and disadvantages of palladium doping for semiconductor power devices.
Keywords :
Electrons; Gold; Leakage current; Palladium; Platinum; Radiative recombination; Semiconductor device doping; Semiconductor diodes; Silicon; Thyristors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1977 International
Type :
conf
DOI :
10.1109/IEDM.1977.189299
Filename :
1479379
Link To Document :
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