DocumentCode
3554595
Title
Diffusion current effects in DMOS transistors
Author
Harper, D.H. ; Thomas, R.E.
Author_Institution
Carleton University, Ottawa, Canada
Volume
24
fYear
1978
fDate
1978
Firstpage
34
Lastpage
37
Abstract
To show the effects of a non-constant impurity profile along the channel of a MOST, a simple numerical model has been developed. The analysis is applied to a DMOST intended for low voltage digital applications. The model accounts for the variation in flat band voltage, substrate potential, and surface mobility along the channel. Results show that diffusion current plays a significant role especially in the ´short channel´ mode of DMOST operation. This in part explains why unrealistic parameter values must often be assigned to existing DMOST models to obtain agreement with experimental results.
Keywords
Circuits; Doping; Impurities; Low voltage; MOSFETs; Mathematics; Numerical simulation; Resistors; Semiconductor process modeling; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1978 International
Type
conf
DOI
10.1109/IEDM.1978.189345
Filename
1479770
Link To Document