Title :
Self aligned CMOS processing with Rh and Ag L line sources
Author :
Peckerar, M.C. ; Taylor, C.J. ; Blais, P.D.
Author_Institution :
Westinghouse Electric Corporation, Baltimore
Abstract :
CMOS processing with x-ray lithography is reviewed. X-ray source selection, resist handling techniques and dry etching methods are discussed. The problem of photo electron spreading in PBS is also discussed. Slope of the resist side wall is shown to be a more serious problem in limiting resolution.
Keywords :
Annealing; CMOS process; Costs; Dry etching; Electromagnetic wave absorption; Electrons; Laboratories; Resists; Silver; X-ray lithography;
Conference_Titel :
Electron Devices Meeting, 1978 International
DOI :
10.1109/IEDM.1978.189484
