DocumentCode
3554745
Title
Self aligned CMOS processing with Rh and Ag L line sources
Author
Peckerar, M.C. ; Taylor, C.J. ; Blais, P.D.
Author_Institution
Westinghouse Electric Corporation, Baltimore
Volume
24
fYear
1978
fDate
1978
Firstpage
588
Lastpage
590
Abstract
CMOS processing with x-ray lithography is reviewed. X-ray source selection, resist handling techniques and dry etching methods are discussed. The problem of photo electron spreading in PBS is also discussed. Slope of the resist side wall is shown to be a more serious problem in limiting resolution.
Keywords
Annealing; CMOS process; Costs; Dry etching; Electromagnetic wave absorption; Electrons; Laboratories; Resists; Silver; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1978 International
Type
conf
DOI
10.1109/IEDM.1978.189484
Filename
1479909
Link To Document