Title :
BEST (Base Emitter Self-aligned Technology) a new fabrication method for bipolar LSI
Author :
Shimizu, M. ; Kitabayashi, H.
Author_Institution :
OKI Electric Industry Co, Ltd., Tokyo, Japan
Abstract :
Base Emitter Self-aligned Technology (BEST) as developed as a practical method to increase the packing density of bipolar LSIs and to realize high speed when operated at low power. The BEST technology applies a selective oxidation technique on poly silicon. It produces a smaller device and reduces the circuit parasitic capacitance. An experimental low power CML 29-stage ring oscillator was made using BEST. Propagation delay time of 0.65 nanoseconds per gate was obtained at a power dissipation per gate of 0.6 milliwatts.
Keywords :
Circuits; Fabrication; Large scale integration; Oxidation; Parasitic capacitance; Propagation delay; Resistors; Ring oscillators; Silicon; Textile industry;
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
DOI :
10.1109/IEDM.1979.189617