DocumentCode :
3554928
Title :
BEST (Base Emitter Self-aligned Technology) a new fabrication method for bipolar LSI
Author :
Shimizu, M. ; Kitabayashi, H.
Author_Institution :
OKI Electric Industry Co, Ltd., Tokyo, Japan
Volume :
25
fYear :
1979
fDate :
1979
Firstpage :
332
Lastpage :
335
Abstract :
Base Emitter Self-aligned Technology (BEST) as developed as a practical method to increase the packing density of bipolar LSIs and to realize high speed when operated at low power. The BEST technology applies a selective oxidation technique on poly silicon. It produces a smaller device and reduces the circuit parasitic capacitance. An experimental low power CML 29-stage ring oscillator was made using BEST. Propagation delay time of 0.65 nanoseconds per gate was obtained at a power dissipation per gate of 0.6 milliwatts.
Keywords :
Circuits; Fabrication; Large scale integration; Oxidation; Parasitic capacitance; Propagation delay; Resistors; Ring oscillators; Silicon; Textile industry;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
Type :
conf
DOI :
10.1109/IEDM.1979.189617
Filename :
1480482
Link To Document :
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