DocumentCode :
3554989
Title :
A new silicon heterojunction transistor using the doped SIPOS
Author :
Oh-uchi, N. ; Hayashi, H. ; Yamoto, H. ; Matsushita, T.
Author_Institution :
SONY Corporation, Atsugi, JAPAN
Volume :
25
fYear :
1979
fDate :
1979
Firstpage :
522
Lastpage :
525
Abstract :
A new silicon npn heterojunction transistor with the emitter Gummel number of 2 × 1015s/cm4has been realized using the P-doped SIPOS. The P-doped SIPOS used as an emitter has a wide energy band gap of 1.5 eV and the recombination velocity at SIPOS-Si interface is a very low value of the order of 102cm/s. Therefore, the current gain of the SIPOS-Si heterojunction transistor can be about 50 times as large as that of conventional silicon homojunction transistors with the same base Gummel number. A pnp heterojunction transistor has been also developed using the B-doped SIPOS and its current gain is about 5 times as large as that of conventional silicon pnp transistors.
Keywords :
Annealing; Chemicals; Heterojunctions; Hydrogen; Nitrogen; Photonic band gap; Radiative recombination; Semiconductor films; Silicon devices; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
Type :
conf
DOI :
10.1109/IEDM.1979.189673
Filename :
1480538
Link To Document :
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