DocumentCode :
3555033
Title :
Plasma-assisted etching for electron device fabrication
Author :
Mogab, C.J.
Author_Institution :
Bell Laboratories, Murray Hill, New Jersey, USA
Volume :
25
fYear :
1979
fDate :
1979
Firstpage :
675
Lastpage :
675
Keywords :
Anisotropic magnetoresistance; Chemical products; Electron devices; Etching; Fabrication; Gases; Plasma applications; Plasma devices; Solids; Surface discharges;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
Type :
conf
DOI :
10.1109/IEDM.1979.189716
Filename :
1480581
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3555033
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