Title :
A novel liftoff process for VLSI using plasma deposition and etching
Author :
Shibata, H. ; Iwasaki, H. ; Oku, T. ; Tarui, Y.
Author_Institution :
VLSI Technical Research Association, Kawasaki, Japan
Keywords :
Etching; Heat treatment; Plasma applications; Plasma devices; Resists; Shape; Space heating; Space technology; Stress; Very large scale integration;
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
DOI :
10.1109/IEDM.1979.189728
