DocumentCode :
3555049
Title :
Reliability of power GaAs field-effect transistors
Author :
Fukui, H. ; Wemple, S.H. ; Irvin, J.C. ; Niehaus, W.C. ; Hwang, J.C.M. ; Cox, H.M. ; Schlosser, W.O. ; DiLorenzo, J.V.
Author_Institution :
Bell Laboratories, Murray Hill, New Jersey
Volume :
25
fYear :
1979
fDate :
1979
Firstpage :
695
Lastpage :
695
Abstract :
A preliminary report on a comprehensive study of the reliability of power GaAs FETs is presented, concerning the catastrophic burn-out failure and gradual degradation failure. The samples used are all 6-mm-wide devices with a nominal gate length of 2 micrometers. The life tests have been carried out at elevated channel temperatures of 250°C, 210°C, and 175°C, simultaneously, with samples of 16, 56, and 140, respectively, under dc bias conditions of 14-V drain-source voltage and 0.55-A drain current in all cases. Since the initiation of this program, none of the above 212 devices has burned out for a total of 730,000 device-hours at the time of this writing. Therefore, the failure rate at normal operational temperature can be predicted under various assumptions. An extremely slow degradation in the electrical parameters has been observed with the 250°C and 210°C tests. At the 175°C, no detectable deterioration has taken place so far. Using a new technique the gradual degradation symptom has been analyzed and possible mechanisms are pointed out. In addition, thermally accelerated life tests with a 4-GHz input of 0.63W have shown aging results comparable to those of the dc-bias-only cases.
Keywords :
Accelerated aging; FETs; Gallium arsenide; Life estimation; Life testing; Temperature; Thermal degradation; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1979 Internationa
Type :
conf
DOI :
10.1109/IEDM.1979.189732
Filename :
1480597
Link To Document :
بازگشت