DocumentCode :
3555093
Title :
Low dielectric constant interconnect technology-a paradigm for interdisciplinary industry-university programs
Author :
Gutmann, Ronald J. ; Isaac, Randall
Author_Institution :
Center for Integrated Electron., Rensselaer Polytech. Inst., Troy, NY, USA
fYear :
1991
fDate :
12-14 Jun 1991
Firstpage :
33
Lastpage :
36
Abstract :
A multidisciplinary vertically integrated and professional-interactive industry-university research program is described. Unique features of the program include joint definition (and guidance) of research directions and priorities, extensive interactions between university and industry researchers within similar disciplines, and extensive on-campus interaction between the disciplines involved. While the research program in ongoing, the authors believe that the successful interactions and research results to date indicate that a new paradigm for sizably scaled interdisciplinary industry-university programs is being established
Keywords :
integrated circuit technology; metallisation; permittivity; research and development management; interdisciplinary industry-university programs; low dielectric constant interconnect technology; professional-interactive industry-university research; research program; vertically integrated; Cultural differences; Dielectric constant; Electrical capacitance tomography; Electronics industry; Government; Industrial electronics; Packaging; Technology transfer; Testing; Vehicles;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1991. Proceedings., Ninth Biennial
Conference_Location :
Melbourne, FL
ISSN :
0749-6877
Print_ISBN :
0-7803-0109-9
Type :
conf
DOI :
10.1109/UGIM.1991.148116
Filename :
148116
Link To Document :
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