DocumentCode :
3555133
Title :
Thermal resistance of GaAs field-effect transistors
Author :
Fukui, Hatsuaki
Author_Institution :
Bell Laboratories, Murray Hill, New Jersey
Volume :
26
fYear :
1980
fDate :
1980
Firstpage :
118
Lastpage :
121
Abstract :
Characterization of the thermal resistance of GaAs FETs is presented. An electrical method of measuring it is first described. An anomaly in the thermal resistance discovered at high temperature is explained, Experimental findings are discussed on the theoretical background. Practical expressions are then derived for the thermal resistance in terms of device geometry and channel temperature. The expressions are verified to be accurate in comparison with our experimental results and with the measured values obtained by infrared microscopes elsewhere. They are useful not only for designing power GaAs FETs but also for optimizing the amplifier performance.
Keywords :
Design optimization; Electric resistance; Electric variables measurement; Electrical resistance measurement; FETs; Gallium arsenide; Geometry; Microscopy; Temperature; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1980 International
Type :
conf
DOI :
10.1109/IEDM.1980.189768
Filename :
1481211
Link To Document :
بازگشت