• DocumentCode
    3555133
  • Title

    Thermal resistance of GaAs field-effect transistors

  • Author

    Fukui, Hatsuaki

  • Author_Institution
    Bell Laboratories, Murray Hill, New Jersey
  • Volume
    26
  • fYear
    1980
  • fDate
    1980
  • Firstpage
    118
  • Lastpage
    121
  • Abstract
    Characterization of the thermal resistance of GaAs FETs is presented. An electrical method of measuring it is first described. An anomaly in the thermal resistance discovered at high temperature is explained, Experimental findings are discussed on the theoretical background. Practical expressions are then derived for the thermal resistance in terms of device geometry and channel temperature. The expressions are verified to be accurate in comparison with our experimental results and with the measured values obtained by infrared microscopes elsewhere. They are useful not only for designing power GaAs FETs but also for optimizing the amplifier performance.
  • Keywords
    Design optimization; Electric resistance; Electric variables measurement; Electrical resistance measurement; FETs; Gallium arsenide; Geometry; Microscopy; Temperature; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1980 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1980.189768
  • Filename
    1481211