• DocumentCode
    3555169
  • Title

    Improvements in method and apparatus for determining minority carrier diffusion length

  • Author

    Goodman, Alvin M.

  • Author_Institution
    RCA Laboratories, Princeton, New Jersey
  • Volume
    26
  • fYear
    1980
  • fDate
    1980
  • Firstpage
    231
  • Lastpage
    234
  • Abstract
    The constant-magnitude steady-state surface photovoltage (SPV) method for determining the minority carrier diffusion length L is in principle an excellent technique. It has, however, recevied relatively limited use because of practical difficulties in carrying out the required measurements. This paper describes an improved measurement system that virtually eliminates these difficulties and allows a rapid straightforward determination of L. These measurements in silicon monitor wafers have enabled a routine quality control check on many factory processing steps, particularly those that are carried out at high temperature and have the potential for significantly degrading L.
  • Keywords
    Augmented virtuality; Charge carrier density; Length measurement; Optical filters; Optical surface waves; Particle measurements; Photonic band gap; Semiconductor device measurement; Steady-state; Wavelength measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1980 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1980.189801
  • Filename
    1481244