DocumentCode :
3555170
Title :
Capacitance measurement technique in high density MOS structures
Author :
Iwai, Hiroshi ; Kohyama, Susumu
Author_Institution :
Toshiba Corporation, Kawasaki, Japan
Volume :
26
fYear :
1980
fDate :
1980
Firstpage :
235
Lastpage :
238
Abstract :
A precise capacitance measurement technique is described. This technique is based on a principle of capacitively devided a.c. voltage measurement. In test devices, reference and test capacitors are connected in series, and intermidiate node signal is monitored by on chip linear sense amplifier. Utilizing the technique, various capacitances were measured, and quantitativery compared with a two dimensional numerical analysis. The results indicate that the technique is practical and accurate for evaluating capacitive elements in VLSI´s.
Keywords :
Capacitance measurement; Circuit testing; Geometry; Laboratories; MOS capacitors; Parasitic capacitance; Pulse amplifiers; Semiconductor device measurement; Semiconductor devices; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1980 International
Type :
conf
DOI :
10.1109/IEDM.1980.189802
Filename :
1481245
Link To Document :
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