Title :
Capacitance measurement technique in high density MOS structures
Author :
Iwai, Hiroshi ; Kohyama, Susumu
Author_Institution :
Toshiba Corporation, Kawasaki, Japan
Abstract :
A precise capacitance measurement technique is described. This technique is based on a principle of capacitively devided a.c. voltage measurement. In test devices, reference and test capacitors are connected in series, and intermidiate node signal is monitored by on chip linear sense amplifier. Utilizing the technique, various capacitances were measured, and quantitativery compared with a two dimensional numerical analysis. The results indicate that the technique is practical and accurate for evaluating capacitive elements in VLSI´s.
Keywords :
Capacitance measurement; Circuit testing; Geometry; Laboratories; MOS capacitors; Parasitic capacitance; Pulse amplifiers; Semiconductor device measurement; Semiconductor devices; Voltage measurement;
Conference_Titel :
Electron Devices Meeting, 1980 International
DOI :
10.1109/IEDM.1980.189802