DocumentCode :
3555178
Title :
Parasitic capacitance influence in micron and submicron CMOS/SOS
Author :
Pattanayak, D.N. ; Poksheva, J.G. ; Beguwala, M.M.
Author_Institution :
Rockwell International, Anaheim, California
Volume :
26
fYear :
1980
fDate :
1980
Firstpage :
260
Lastpage :
263
Abstract :
The impact of parasitic capacitance in micron and submicron CMOS/SOS implementations is explored. Relative measures of parasitic fringing and interconnect capacitance associated with ring oscillator and high-speed 1/64 frequency divider (400 MHz at 4V) circuit layouts are investigated. Parasitic capacitance figures of merit are analyzed in terms of several key geometrical dimensions, from which sensitivity of parasitic influence on circuit speed to departure from ideal scaling laws can be deduced. Analytical and numerical results and design considerations moderating deleterious effects of parasitic capacitance in down scaling from 2 to 1 to 0.5µm CMOS/SOS technologies are discussed.
Keywords :
CMOS technology; Capacitance measurement; Capacitors; Counting circuits; Dielectric substrates; Frequency conversion; Integrated circuit interconnections; Parasitic capacitance; Ring oscillators; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1980 International
Type :
conf
DOI :
10.1109/IEDM.1980.189809
Filename :
1481252
Link To Document :
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