DocumentCode :
3555332
Title :
VLSI - A totally self-aligned MOS transistor
Author :
Custode, F.Z. ; Tam, M.
Author_Institution :
Rockwell International Corporation, Anaheim, California
fYear :
1980
fDate :
8-10 Dec. 1980
Firstpage :
760
Lastpage :
763
Abstract :
High-performance systems of the future will require high-density, very high-speed integrated. circuits. Employing the new totally self-aligned concepts proposed here, it is new feasible to achieve even higher densities and speeds. This is done by self-aligning both the gates, contacts, and metal to the active area, resulting in a totally self-aligned structure. Reduced parasitic effects and overlay requirements make this technology extremely attractive for submicron applications.
Keywords :
Circuits; Etching; Fabrication; Implants; MOSFETs; Oxidation; Protection; Resists; Silicon; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1980 International
Conference_Location :
Washington, DC, USA
Type :
conf
DOI :
10.1109/IEDM.1980.189948
Filename :
1481391
Link To Document :
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