• DocumentCode
    3555332
  • Title

    VLSI - A totally self-aligned MOS transistor

  • Author

    Custode, F.Z. ; Tam, M.

  • Author_Institution
    Rockwell International Corporation, Anaheim, California
  • fYear
    1980
  • fDate
    8-10 Dec. 1980
  • Firstpage
    760
  • Lastpage
    763
  • Abstract
    High-performance systems of the future will require high-density, very high-speed integrated. circuits. Employing the new totally self-aligned concepts proposed here, it is new feasible to achieve even higher densities and speeds. This is done by self-aligning both the gates, contacts, and metal to the active area, resulting in a totally self-aligned structure. Reduced parasitic effects and overlay requirements make this technology extremely attractive for submicron applications.
  • Keywords
    Circuits; Etching; Fabrication; Implants; MOSFETs; Oxidation; Protection; Resists; Silicon; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1980 International
  • Conference_Location
    Washington, DC, USA
  • Type

    conf

  • DOI
    10.1109/IEDM.1980.189948
  • Filename
    1481391