DocumentCode
3555332
Title
VLSI - A totally self-aligned MOS transistor
Author
Custode, F.Z. ; Tam, M.
Author_Institution
Rockwell International Corporation, Anaheim, California
fYear
1980
fDate
8-10 Dec. 1980
Firstpage
760
Lastpage
763
Abstract
High-performance systems of the future will require high-density, very high-speed integrated. circuits. Employing the new totally self-aligned concepts proposed here, it is new feasible to achieve even higher densities and speeds. This is done by self-aligning both the gates, contacts, and metal to the active area, resulting in a totally self-aligned structure. Reduced parasitic effects and overlay requirements make this technology extremely attractive for submicron applications.
Keywords
Circuits; Etching; Fabrication; Implants; MOSFETs; Oxidation; Protection; Resists; Silicon; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1980 International
Conference_Location
Washington, DC, USA
Type
conf
DOI
10.1109/IEDM.1980.189948
Filename
1481391
Link To Document