Polycrystalline diamond device processing

1 The authors describe processes developed for the fabrication of accelerometers, flow sensors, and microchannel cooling structures, using selectively deposited films and silicon micromachining. The diamond films were grown using an ASTeX high-pressure microwave chemical vapor deposition reactor at 950+/-25°C with a growth rate of approximately 1 μm/h. It was found that polycrystalline diamond films can be used to fabricate various microstructures. A technique for doping diamond films is shown to lower the resistance of the as-grown films