DocumentCode :
3555462
Title :
SnO2/n-Si solar cell
Author :
Hayashi, Yutaka ; Yamanaka, Mitsuyuki ; Murayama, Jin
Author_Institution :
Electrotechnical Laboratory, Ibaraki, Japan
Volume :
27
fYear :
1981
fDate :
1981
Firstpage :
138
Lastpage :
141
Abstract :
Low cost and low production energy SnO2/n-Si solar cells with conversion efficiency of 15.4% (at best) (66mW/cm2, AMl spectrum) were obtained by low temperature CVD of SnO2using SnCl4, H2O and SbCl5as source meterial. The maximum processing temperature of the CVD was 350°C. This low temperature CVD processing makes continuous volume production of the cells far easier than conventional technologies. Stability of the cell was studied under various ambient condition and a stable cell/module structure was developed. Dependence of cell characteristics on the processing conditions and stability data of the fabricated cells are reported.
Keywords :
Circuits; Costs; Optical films; Photovoltaic cells; Production; Semiconductor films; Stability; Substrates; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1981 International
Type :
conf
DOI :
10.1109/IEDM.1981.190021
Filename :
1481974
Link To Document :
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